Cleaning, Etching (ACE). Anodized aluminum chamber, 10 to 150 watts, automatic tuning 13.56 MHz, two flowmeters, Plasma or RIE style processing with oxygen, argon or CF4 chemistry.
Ideal for etching IC packages or other etching/cleaning applicaitons. Has sample holder with two shelves…top shelf for RIE, bottom shelf for plasma processing. Designed for a long processing time–push button, automatic operation.
