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samadii/plasma: Reactive Ion Etching(RIE) simulation (CUDA)

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Aug 3, 2020
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Reactive Ion Etching (RIE) is a plasma etching technology to fabricate micro and nano-structures. During RIE etching processes, volatile compounds are formed in the interaction of sample surfaces and high-energy ions/radicals generated by the low-pressure plasma. Metariver Technology http://www.metariver.kr/ Don’t forget to subscribe: https://www.youtube.com/channel/UCaNORJnwY9LfvbBzJxSOBSw Follow us! Linkedin: https://www.linkedin.com/company/metariver-technology Facebook: https://www.facebook.com/metariver/ Twitter: https://twitter.com/MetariverT Instagram: https://www.instagram.com/metarivertechnology/ #plasma #oled #diaplay #semiconductor #dsmc #particlesystem #particlephysics #simulation #cae #cuda #gpucomputing #samadii #metarivertechnology

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